A thermally stable alane-secondary amine adduct: [H3Al(2,2,6,6- tetramethylpiperidine)]

Jerry L. Atwood, George A. Koutsantonis, Fu Chin Lee, Colin L. Raston

Research output: Contribution to journalArticlepeer-review

55 Citations (Scopus)

Abstract

Metallation of 2,2,6,6-tetramethylpiperidine, HN[CMe2CH 2]2CH2 (=HL), by H3AlNMe3 in diethyl ether affords a monomeric, Lewis base-stabilised amidoalane Me 3NAlH2L, 1 [Al-Namido, Namine 1.838(2), 2.058(2) Å], whereas treating AlH3 generated in situ with the same amine in diethyl ether yields a remarkably stable secondary amine adduct of alane H3Al(HL), 2 (decomp. > 115°C), also as a monomer in the solid [Al-NHL 2.04(1) Å].

Original languageEnglish
Pages (from-to)91-92
Number of pages2
JournalJournal of the Chemical Society, Chemical Communications
Issue number1
DOIs
Publication statusPublished - 7 Jan 1994
Externally publishedYes

Fingerprint

Dive into the research topics of 'A thermally stable alane-secondary amine adduct: [H3Al(2,2,6,6- tetramethylpiperidine)]'. Together they form a unique fingerprint.

Cite this