A two dimensional analytical model of drain to source current and subthreshold slope of a triple material double gate MOSFET

M. A. Mahmud, S. Subrina

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Citations (Scopus)

Abstract

A two dimensional analytical model of drain to source current as well as subthreshold slope of a triple material double gate MOSFET has been developed in this work. Basic drift-diffusion equation has been used to derive the drain to source current model. An expression of pinch-off voltage has been derived for modeling drain current in saturation region. The current in the device has been studied as function of drain to source voltage and gate voltage as well. In the work, leakage current in zero gate bias condition has also been presented. Variations in subthreshold slope of the device owing to change in device parameters have been lifted up. Our model results have been verified with the simulation data obtained by using a professional numerical device simulator.

Original languageEnglish
Title of host publication8th International Conference on Electrical and Computer Engineering
Subtitle of host publicationAdvancing Technology for a Better Tomorrow, ICECE 2014
PublisherInstitute of Electrical and Electronics Engineers
Pages92-95
Number of pages4
ISBN (Electronic)9781479941667
DOIs
Publication statusPublished - 29 Jan 2015
Externally publishedYes
Event8th International Conference on Electrical and Computer Engineering, ICECE 2014 - Dhaka, Bangladesh
Duration: 20 Dec 201422 Dec 2014

Publication series

Name8th International Conference on Electrical and Computer Engineering: Advancing Technology for a Better Tomorrow, ICECE 2014

Conference

Conference8th International Conference on Electrical and Computer Engineering, ICECE 2014
Country/TerritoryBangladesh
CityDhaka
Period20/12/1422/12/14

Keywords

  • Drain to source current
  • gate engineering
  • leakage current
  • pinch off voltage
  • subthreshold slope

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