Adsorption of the trimethylamine adduct of aluminium hydride on silicon oxide

Fiona M. Elms, Robert N. Lamb, Paul J. Pigram, Michael G. Gardiner, Barry J. Wood, Colin L. Raston

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)


X-Ray photoelectron spectroscopy (XPS) and static secondary ion mass spectroscopy (SSIMS) studies of surface adsorbed H3AINMe3 on a SiO2 substrate support molecular adsorption, most likely as a five coordinate species, H3AINMe3(O=), and an aluminium rich species (Al: N 2: 1) sensitive to the amount of exposure to the vapour; ab initio molecular orbital calculations on H3AINH3 and H2O gave formation of H3AINH3(OH2) as energetically favoured by 4.53 kcal mol-1, and fragmentation of H3AINH3(OH2) to H3AIOH2 and NH3 requiring 13.16 kcal mol-1 (1 cal = 4.184 J).

Original languageEnglish
Pages (from-to)1423-1425
Number of pages3
JournalJournal of the Chemical Society, Chemical Communications
Issue number19
Publication statusPublished - 1 Oct 1992
Externally publishedYes


Dive into the research topics of 'Adsorption of the trimethylamine adduct of aluminium hydride on silicon oxide'. Together they form a unique fingerprint.

Cite this