Applicator to provide uniform electric and magnetic fields over a large area and for continuous processing [Expired]

David Lewis; A Viehbeck; S Whitehair

Applicator to provide uniform electric and magnetic fields over a large area and for continuous processing [Expired]

David Lewis (Inventor), A Viehbeck (Inventor), S Whitehair (Inventor)

Research output: Patent

Abstract

A microwave applicator that provides a substantially uniform microwave field distribution over a large area, includes an elongated chamber, preferably operating in the length independent mode. A microwave source generates a microwave field at an output frequency. A waveguide or coaxial cable directs the microwave field from the microwave source into the elongated chamber, either through a side launch, end launch or multi launch. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.

Original language	English
Patent number	US6121595A
Publication status	Published - 2000

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https://patents.google.com/patent/US6121595A/

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Lewis, D., Viehbeck, A., & Whitehair, S. (2000). Applicator to provide uniform electric and magnetic fields over a large area and for continuous processing [Expired]. (Patent No. US6121595A). https://patents.google.com/patent/US6121595A/

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abstract = "A microwave applicator that provides a substantially uniform microwave field distribution over a large area, includes an elongated chamber, preferably operating in the length independent mode. A microwave source generates a microwave field at an output frequency. A waveguide or coaxial cable directs the microwave field from the microwave source into the elongated chamber, either through a side launch, end launch or multi launch. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.",

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year = "2000",

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T1 - Applicator to provide uniform electric and magnetic fields over a large area and for continuous processing [Expired]

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AU - Viehbeck, A

AU - Whitehair, S

PY - 2000

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N2 - A microwave applicator that provides a substantially uniform microwave field distribution over a large area, includes an elongated chamber, preferably operating in the length independent mode. A microwave source generates a microwave field at an output frequency. A waveguide or coaxial cable directs the microwave field from the microwave source into the elongated chamber, either through a side launch, end launch or multi launch. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.

AB - A microwave applicator that provides a substantially uniform microwave field distribution over a large area, includes an elongated chamber, preferably operating in the length independent mode. A microwave source generates a microwave field at an output frequency. A waveguide or coaxial cable directs the microwave field from the microwave source into the elongated chamber, either through a side launch, end launch or multi launch. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.

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