Atomic layer deposition of SiO₂ on porous alumina membranes: controlling the pore size and transport properties

Atomic layer deposition (ALD) of SiO² onto nanoporous alumina (PA) membranes was investigated with the aim of adjusting the pore size and transport properties. PA membranes from commercial sources with a range of pore diameters (20 nm, 100 nm and 200 nm) were used and modified by atomic layer deposition using tris(tert-butoxy)silanol and water as the precursor couple. By adjusting the number of deposition cycles, the thickness of the conformal silica coating was controlled, reducing the effective pore diameter, and subsequently changing the transport properties of the PA membrane. Silica coated PA membranes with desired pore diameters from <5 nm to 100 nm were fabricated. In addition to the pore size, the transport properties and selectivity of fabricated silica coated PA membranes were controlled by chemical functionalisation using a silane with hydrophobic properties. Structural and chemical properties of modified membranes were studied by dynamic secondary ion mass spectrometry (DSIMS) and scanning electron microscopy (SEM). Spectrophotometric methods were used to evaluate the transport properties and selectivity of silica coated membranes by permeation studies of hydrophobic and hydrophilic organic molecules. The resultant silica/PA membranes with specific surface chemistry and controlled pore size are applicable for molecular separation, cell culture, bioreactors, biosensing and drug delivery.