Corrigendum: The burning rate of energetic films of nanostructured porous silicon (Small (2011) 23 (3392-3398) DOI: 10.1002/smll.201101087)

Andrew Plummer; Valerian Kuznetsov; Timothy Joyner; Joe Shapter; Nicolas H. Voelcker

doi:10.1002/smll.201190094

Corrigendum: The burning rate of energetic films of nanostructured porous silicon (Small (2011) 23 (3392-3398) DOI: 10.1002/smll.201101087)

Andrew Plummer, Valerian Kuznetsov, Timothy Joyner, Joe Shapter, Nicolas H. Voelcker

Research output: Contribution to journal › Comment/debate

Abstract

Between Early View online publication and issue publication, the authors became aware of an additional relevant reference.^[23] Becker et al. reported ﬂame propagation velocities for pSi impregnated with NaClO₄ on the order of 3000 m/s. In their work, thepSi was prepared by galvanic etching, and the velocity measurements were performed in a desiccator box under nitrogen at arelative humidity below 2%.

[23] C. R. Becker, S. Apperson, C. J. Morris, S. Gangopadhyay, L. J. Currano, W. A. Churaman, C. R. Stoldt, Nano Lett. 2011, 11, 803.

Original language	English
Pages (from-to)	3260
Number of pages	1
Journal	Small
Volume	7
Issue number	23
DOIs	https://doi.org/10.1002/smll.201190094
Publication status	Published - 2 Dec 2011

Access to Document

10.1002/smll.201190094Licence: In Copyright

Cite this

@article{eb5b6304ae8a44f7a2358edfa6d5c5b1,

title = "Corrigendum: The burning rate of energetic films of nanostructured porous silicon (Small (2011) 23 (3392-3398) DOI: 10.1002/smll.201101087)",

abstract = "Between Early View online publication and issue publication, the authors became aware of an additional relevant reference.[23] Becker et al. reported ﬂame propagation velocities for pSi impregnated with NaClO4 on the order of 3000 m/s. In their work, thepSi was prepared by galvanic etching, and the velocity measurements were performed in a desiccator box under nitrogen at arelative humidity below 2%.[23] C. R. Becker, S. Apperson, C. J. Morris, S. Gangopadhyay, L. J. Currano, W. A. Churaman, C. R. Stoldt, Nano Lett. 2011, 11, 803.",

author = "Andrew Plummer and Valerian Kuznetsov and Timothy Joyner and Joe Shapter and Voelcker, {Nicolas H.}",

year = "2011",

month = dec,

day = "2",

doi = "10.1002/smll.201190094",

language = "English",

volume = "7",

pages = "3260",

journal = "Small",

issn = "1613-6810",

publisher = "Wiley",

number = "23",

}

TY - JOUR

T1 - Corrigendum

T2 - The burning rate of energetic films of nanostructured porous silicon (Small (2011) 23 (3392-3398) DOI: 10.1002/smll.201101087)

AU - Plummer, Andrew

AU - Kuznetsov, Valerian

AU - Joyner, Timothy

AU - Shapter, Joe

AU - Voelcker, Nicolas H.

PY - 2011/12/2

Y1 - 2011/12/2

N2 - Between Early View online publication and issue publication, the authors became aware of an additional relevant reference.[23] Becker et al. reported ﬂame propagation velocities for pSi impregnated with NaClO4 on the order of 3000 m/s. In their work, thepSi was prepared by galvanic etching, and the velocity measurements were performed in a desiccator box under nitrogen at arelative humidity below 2%.[23] C. R. Becker, S. Apperson, C. J. Morris, S. Gangopadhyay, L. J. Currano, W. A. Churaman, C. R. Stoldt, Nano Lett. 2011, 11, 803.

AB - Between Early View online publication and issue publication, the authors became aware of an additional relevant reference.[23] Becker et al. reported ﬂame propagation velocities for pSi impregnated with NaClO4 on the order of 3000 m/s. In their work, thepSi was prepared by galvanic etching, and the velocity measurements were performed in a desiccator box under nitrogen at arelative humidity below 2%.[23] C. R. Becker, S. Apperson, C. J. Morris, S. Gangopadhyay, L. J. Currano, W. A. Churaman, C. R. Stoldt, Nano Lett. 2011, 11, 803.

UR - http://www.scopus.com/inward/record.url?scp=82555192624&partnerID=8YFLogxK

U2 - 10.1002/smll.201190094

DO - 10.1002/smll.201190094

M3 - Comment/debate

AN - SCOPUS:82555192624

SN - 1613-6810

VL - 7

SP - 3260

JO - Small

JF - Small

IS - 23

ER -

Corrigendum: The burning rate of energetic films of nanostructured porous silicon (Small (2011) 23 (3392-3398) DOI: 10.1002/smll.201101087)

Abstract

Access to Document

Other files and links

Fingerprint

Cite this