Cross-Cultural Re-Entry for Missionaries: A New Application for the Dual Process Model.

Susan Selby, Sheila Clark, Annette Braunack-Mayer, Alison Jones, Nicole Moulding, Justin Beilby

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Nearly half a million foreign aid workers currently work worldwide, including over 140,000 missionaries. During re-entry these workers may experience significant psychological distress. This article positions previous research about psychological distress during re-entry, emphasizing loss and grief. At present there is no identifiable theoretical framework to provide a basis for assessment, management, and prevention of re-entry distress in the clinical setting. The development of theoretical concepts and frameworks surrounding loss and grief including the Dual Process Model (DPM) are discussed. All the parameters of the DPM have been shown to be appropriate for the proposed re-entry model, the Dual Process Model applied to Re-entry (DPMR). It is proposed that the DPMR is an appropriate framework to address the processes and strategies of managing re-entry loss and grief. Possible future clinical applications and limitations of the proposed model are discussed. The DPMR is offered for further validation and use in clinical practice.

Original languageEnglish
Pages (from-to)329-351
Number of pages23
JournalOmega-Journal of Death and Dying
Volume62
Issue number4
DOIs
Publication statusPublished - 1 Jun 2011
Externally publishedYes

Fingerprint Dive into the research topics of 'Cross-Cultural Re-Entry for Missionaries: A New Application for the Dual Process Model.'. Together they form a unique fingerprint.

Cite this