Density functional theory based evaluations of the reactive ion etchin: Process model for TiO2 (anatase) thin film

Hirofumi Kishi, Nobuki Ozawa, Melanie Y. David, Tanglaw A. Roman, Nelson B. Arboleda, Wilson A.T. Diño, Hiroshi Nakanishi, Hideaki Kasai, Fumiyoshi Takano, Hisashi Shima, Hiro Akinaga

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

We evaluate the reactivity between the surface of the film and gas molecules and determine the optimum gas combinations by calculating the total energy based on the density functional theory. We propose a model for the etching process of titanium oxide thin films. In this model, we consider three specific states, namely, the initial, intermediate and final states. On etching TiO2 (anatase), we observed that it is more efficient to have fluorine-based reactive gases (e.g. CHF3) than other considered reactive gases (e.g. CH4, H2O) in order to enhance the etching.

Original languageJapanese
Pages (from-to)397-400
Number of pages4
JournalJournal of the Vacuum Society of Japan
Volume51
Issue number6
DOIs
Publication statusPublished - 2008
Externally publishedYes

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