Design of multi-aperture masks for sub-nanometer correction of ultra-precision optical components

    Research output: Contribution to journalArticle

    2 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)6375-6380
    Number of pages6
    JournalApplied Optics
    Volume46
    Issue number25
    Publication statusPublished - 2007

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