| Original language | English |
|---|---|
| Pages (from-to) | 6375-6380 |
| Number of pages | 6 |
| Journal | Applied Optics |
| Volume | 46 |
| Issue number | 25 |
| Publication status | Published - 2007 |
Design of multi-aperture masks for sub-nanometer correction of ultra-precision optical components
John Arkwright
Research output: Contribution to journal › Article › peer-review
3
Citations
(Scopus)