Design of reactive ion etching process based on ab-initio calculation: The first step

Shigeno Matsumoto, Wilson A.T. Diño, Melanie Y. David, Rifki Muhida, Tanglaw A. Roman, Shinichi Kunikata, Fumiyoshi Takano, Hiro Akinaga, Hideaki Kasai

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3 Citations (Scopus)

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Engineering & Materials Science

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