Abstract
A microwave processing system comprising a microwave applicator and a microwave source. A microwave source generates a microwave field at an output frequency. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.
| Original language | English |
|---|---|
| Patent number | US6054696A |
| Publication status | Published - 2000 |
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