Improving oxidation efficiency through plasma coupled thin film processing

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A continuous flow vortex fluidic device (VFD) with a non-thermal plasma generated above a dynamic thin liquid film created in a rapidly rotating tube is effective in the oxidation of methylene blue. The VFD allows for the control of the film thickness by adjusting the rotational speed, and through this capability we demonstrate that reducing the film thickness enhances the ability for active oxidizing species produced in the plasma to process material contained within the film. These efficiencies inherent in the VFD technology have general applicability to flux-driven chemical processing, such as photo- and electro-chemical transformations.

Original languageEnglish
Pages (from-to)47111-47115
Number of pages5
JournalRSC Advances
Issue number74
Publication statusPublished - 6 Oct 2017

Bibliographical note

'This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence.'


  • electrochemical
  • chemical processing
  • vortex fluid


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