Improving oxidation efficiency through plasma coupled thin film processing

Darryl B. Jones; Colin L. Raston

doi:10.1039/c7ra09559g

Improving oxidation efficiency through plasma coupled thin film processing

Darryl B. Jones, Colin L. Raston

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

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Abstract

A continuous flow vortex fluidic device (VFD) with a non-thermal plasma generated above a dynamic thin liquid film created in a rapidly rotating tube is effective in the oxidation of methylene blue. The VFD allows for the control of the film thickness by adjusting the rotational speed, and through this capability we demonstrate that reducing the film thickness enhances the ability for active oxidizing species produced in the plasma to process material contained within the film. These efficiencies inherent in the VFD technology have general applicability to flux-driven chemical processing, such as photo- and electro-chemical transformations.

Original language	English
Pages (from-to)	47111-47115
Number of pages	5
Journal	RSC Advances
Volume	7
Issue number	74
DOIs	https://doi.org/10.1039/c7ra09559g
Publication status	Published - 6 Oct 2017

Bibliographical note

'This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence.'

Keywords

electrochemical
chemical processing
vortex fluid

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10.1039/c7ra09559gLicence: CC BY-NC

Jones_Improving_P2017Final published version, 731 KBLicence: CC BY-NC

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title = "Improving oxidation efficiency through plasma coupled thin film processing",

abstract = "A continuous flow vortex fluidic device (VFD) with a non-thermal plasma generated above a dynamic thin liquid film created in a rapidly rotating tube is effective in the oxidation of methylene blue. The VFD allows for the control of the film thickness by adjusting the rotational speed, and through this capability we demonstrate that reducing the film thickness enhances the ability for active oxidizing species produced in the plasma to process material contained within the film. These efficiencies inherent in the VFD technology have general applicability to flux-driven chemical processing, such as photo- and electro-chemical transformations.",

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AU - Raston, Colin L.

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PY - 2017/10/6

Y1 - 2017/10/6

N2 - A continuous flow vortex fluidic device (VFD) with a non-thermal plasma generated above a dynamic thin liquid film created in a rapidly rotating tube is effective in the oxidation of methylene blue. The VFD allows for the control of the film thickness by adjusting the rotational speed, and through this capability we demonstrate that reducing the film thickness enhances the ability for active oxidizing species produced in the plasma to process material contained within the film. These efficiencies inherent in the VFD technology have general applicability to flux-driven chemical processing, such as photo- and electro-chemical transformations.

AB - A continuous flow vortex fluidic device (VFD) with a non-thermal plasma generated above a dynamic thin liquid film created in a rapidly rotating tube is effective in the oxidation of methylene blue. The VFD allows for the control of the film thickness by adjusting the rotational speed, and through this capability we demonstrate that reducing the film thickness enhances the ability for active oxidizing species produced in the plasma to process material contained within the film. These efficiencies inherent in the VFD technology have general applicability to flux-driven chemical processing, such as photo- and electro-chemical transformations.

KW - electrochemical

KW - chemical processing

KW - vortex fluid

U2 - 10.1039/c7ra09559g

DO - 10.1039/c7ra09559g

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VL - 7

SP - 47111

EP - 47115

JO - RSC Advances

JF - RSC Advances

IS - 74

ER -

Improving oxidation efficiency through plasma coupled thin film processing

Abstract

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