Langmuir probe characterization of low-frequency oscillations in a radio-frequency SF6 plasma

Anders Barlow; Alec Deslandes; Jamie Quinton

doi:10.1088/0963-0252/20/6/065011

Langmuir probe characterization of low-frequency oscillations in a radio-frequency SF6 plasma

Anders Barlow, Alec Deslandes, Jamie Quinton

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Abstract

A low-frequency oscillation (<100 Hz) has been observed in a low-pressure (1-50 mTorr) radio-frequency (RF) inductively coupled plasma, produced in sulfur hexafluoride. Langmuir probe studies have characterized this oscillation with respect to RF power, gas pressure and probe proximity to the antenna. The experimental parameter space within which this oscillation is observed is mapped with respect to power and pressure for the reaction chamber in use. The oscillation is observed in Langmuir probe currents for positive probe bias, and has a strong dependence on experimental conditions, as well as probe position within the chamber. The propagation speed of the instability away from the source is found to be 16 m s^-1.

Original language	English
Article number	065011
Pages (from-to)	065011-1-065011-7
Number of pages	7
Journal	Plasma Sources Science and Technology
Volume	20
Issue number	6
DOIs	https://doi.org/10.1088/0963-0252/20/6/065011
Publication status	Published - Dec 2011

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title = "Langmuir probe characterization of low-frequency oscillations in a radio-frequency SF6 plasma",

abstract = "A low-frequency oscillation (<100 Hz) has been observed in a low-pressure (1-50 mTorr) radio-frequency (RF) inductively coupled plasma, produced in sulfur hexafluoride. Langmuir probe studies have characterized this oscillation with respect to RF power, gas pressure and probe proximity to the antenna. The experimental parameter space within which this oscillation is observed is mapped with respect to power and pressure for the reaction chamber in use. The oscillation is observed in Langmuir probe currents for positive probe bias, and has a strong dependence on experimental conditions, as well as probe position within the chamber. The propagation speed of the instability away from the source is found to be 16 m s-1.",

author = "Anders Barlow and Alec Deslandes and Jamie Quinton",

year = "2011",

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T1 - Langmuir probe characterization of low-frequency oscillations in a radio-frequency SF6 plasma

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AU - Deslandes, Alec

AU - Quinton, Jamie

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N2 - A low-frequency oscillation (<100 Hz) has been observed in a low-pressure (1-50 mTorr) radio-frequency (RF) inductively coupled plasma, produced in sulfur hexafluoride. Langmuir probe studies have characterized this oscillation with respect to RF power, gas pressure and probe proximity to the antenna. The experimental parameter space within which this oscillation is observed is mapped with respect to power and pressure for the reaction chamber in use. The oscillation is observed in Langmuir probe currents for positive probe bias, and has a strong dependence on experimental conditions, as well as probe position within the chamber. The propagation speed of the instability away from the source is found to be 16 m s-1.

AB - A low-frequency oscillation (<100 Hz) has been observed in a low-pressure (1-50 mTorr) radio-frequency (RF) inductively coupled plasma, produced in sulfur hexafluoride. Langmuir probe studies have characterized this oscillation with respect to RF power, gas pressure and probe proximity to the antenna. The experimental parameter space within which this oscillation is observed is mapped with respect to power and pressure for the reaction chamber in use. The oscillation is observed in Langmuir probe currents for positive probe bias, and has a strong dependence on experimental conditions, as well as probe position within the chamber. The propagation speed of the instability away from the source is found to be 16 m s-1.

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ER -

Langmuir probe characterization of low-frequency oscillations in a radio-frequency SF6 plasma

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