Original language | English |
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Pages (from-to) | 2549-2557 |
Number of pages | 9 |
Journal | Physics of Plasmas |
Volume | 8 |
Issue number | 5 |
Publication status | Published - 2001 |
Low-Frequency, High-Density, Inductively Coupled Plasma Sources: Operation and Applications
S Xu, Kontyantyn Ostrikov, Y Li, T Tsakadze, Ieuan Jones
Research output: Contribution to journal › Article › peer-review
180
Citations
(Scopus)