Low Temperature Atomic Layer Deposition of Titania Thin Films

Gerry Triani; Jonathan Campbell; Peter Evans; J Davis; B Latella; Robert Burford

doi:10.1016/j.tsf.2009.09.010

Low Temperature Atomic Layer Deposition of Titania Thin Films

Gerry Triani, Jonathan Campbell, Peter Evans, J Davis, B Latella, Robert Burford

Research output: Contribution to journal › Article › peer-review

47 Citations (Scopus)

Abstract

This paper presents a comprehensive study of atomic layer deposition of TiO₂ films on silicon and polycarbonate substrates using TiCl₄ and H₂O as precursors at temperatures in the range 80-120 °C. An in-situ quartz crystal microbalance was used to monitor different processing conditions and the resultant films were characterised ex-situ using a suite of surface analytical tools. In addition, the contact angle and wettability of as-deposited and UV irradiated films were assessed. The latter was found to reduce the contact angle from ≥ 80° to < 10°. Finally, the effect of surface pre-treatment on film toughness and adhesion was investigated and the results show a significant improvement for the pre-treated films.

Original language	English
Pages (from-to)	3182-3189
Number of pages	8
Journal	Thin Solid Films
Volume	518
Issue number	12
DOIs	https://doi.org/10.1016/j.tsf.2009.09.010
Publication status	Published - 2 Apr 2010

Keywords

Adhesion and tensile properties
Atomic layer deposition
Contact angle
Photoactivity
Polymer substrates
Titanium dioxide

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@article{e7fed71b20704914a7edac1302dc3550,

title = "Low Temperature Atomic Layer Deposition of Titania Thin Films",

abstract = "This paper presents a comprehensive study of atomic layer deposition of TiO2 films on silicon and polycarbonate substrates using TiCl4 and H2O as precursors at temperatures in the range 80-120 °C. An in-situ quartz crystal microbalance was used to monitor different processing conditions and the resultant films were characterised ex-situ using a suite of surface analytical tools. In addition, the contact angle and wettability of as-deposited and UV irradiated films were assessed. The latter was found to reduce the contact angle from ≥ 80° to < 10°. Finally, the effect of surface pre-treatment on film toughness and adhesion was investigated and the results show a significant improvement for the pre-treated films.",

keywords = "Adhesion and tensile properties, Atomic layer deposition, Contact angle, Photoactivity, Polymer substrates, Titanium dioxide",

author = "Gerry Triani and Jonathan Campbell and Peter Evans and J Davis and B Latella and Robert Burford",

year = "2010",

month = apr,

day = "2",

doi = "10.1016/j.tsf.2009.09.010",

language = "English",

volume = "518",

pages = "3182--3189",

journal = "Thin Solid Films",

issn = "0040-6090",

number = "12",

}

TY - JOUR

T1 - Low Temperature Atomic Layer Deposition of Titania Thin Films

AU - Triani, Gerry

AU - Campbell, Jonathan

AU - Evans, Peter

AU - Davis, J

AU - Latella, B

AU - Burford, Robert

PY - 2010/4/2

Y1 - 2010/4/2

N2 - This paper presents a comprehensive study of atomic layer deposition of TiO2 films on silicon and polycarbonate substrates using TiCl4 and H2O as precursors at temperatures in the range 80-120 °C. An in-situ quartz crystal microbalance was used to monitor different processing conditions and the resultant films were characterised ex-situ using a suite of surface analytical tools. In addition, the contact angle and wettability of as-deposited and UV irradiated films were assessed. The latter was found to reduce the contact angle from ≥ 80° to < 10°. Finally, the effect of surface pre-treatment on film toughness and adhesion was investigated and the results show a significant improvement for the pre-treated films.

AB - This paper presents a comprehensive study of atomic layer deposition of TiO2 films on silicon and polycarbonate substrates using TiCl4 and H2O as precursors at temperatures in the range 80-120 °C. An in-situ quartz crystal microbalance was used to monitor different processing conditions and the resultant films were characterised ex-situ using a suite of surface analytical tools. In addition, the contact angle and wettability of as-deposited and UV irradiated films were assessed. The latter was found to reduce the contact angle from ≥ 80° to < 10°. Finally, the effect of surface pre-treatment on film toughness and adhesion was investigated and the results show a significant improvement for the pre-treated films.

KW - Adhesion and tensile properties

KW - Atomic layer deposition

KW - Contact angle

KW - Photoactivity

KW - Polymer substrates

KW - Titanium dioxide

UR - http://www.scopus.com/inward/record.url?scp=77649212346&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2009.09.010

DO - 10.1016/j.tsf.2009.09.010

M3 - Article

VL - 518

SP - 3182

EP - 3189

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 12

ER -