LXCat: an Open-Access, Web-Based Platform for Data Needed for Modeling Low Temperature Plasmas

Leanne Pitchford, Luis Alves, Klaus Bartschat, Stephen Biagi, Marie-Claude Bordage, Igor Bray, Chris Brion, Michael Brunger, Laurence Campbell, Alise Chachereau, Bhaskar Chaudhury, Loucas Christophorou, Emile Carbone, Nikolay Dyatko, Christian Franck, Dmitry Fursa, Reetesh Gangwar, Vasco Guerra, Pascal Haefliger, Gerjan HagelaarAndreas Hoesl, Yukikazu Itikawa, Igor Kochetov, Robert McEachran, W Morgan, Anatoly Napartovich, Vincent Puech, Mohamed Rabie, Lalita Sharma, Rajesh Srivastava, Allan Stauffer, Jonathan Tennyson, Jaime de Urquijo, Jan van Dijk, Larry Viehland, Mark Zammit, Oleg Zatsarinny, Sergey Pancheshnyi

    Research output: Contribution to journalArticle

    64 Citations (Scopus)

    Abstract

    LXCat is an open-access platform (www.lxcat.net) for curating data needed for modeling the electron and ion components of technological plasmas. The data types presently supported on LXCat are scattering cross sections and swarm/transport parameters, ion-neutral interaction potentials, and optical oscillator strengths. Twenty-four databases contributed by different groups around the world can be accessed on LXCat. New contributors are welcome; the database contributors retain ownership and are responsible for the contents and maintenance of the individual databases. This article summarizes the present status of the project.

    Original languageEnglish
    Article number1600098
    Pages (from-to)Art: 1600098
    Number of pages17
    JournalPlasma Processes and Polymers
    Volume14
    Issue number1-2
    DOIs
    Publication statusPublished - 2017

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  • Cite this

    Pitchford, L., Alves, L., Bartschat, K., Biagi, S., Bordage, M-C., Bray, I., Brion, C., Brunger, M., Campbell, L., Chachereau, A., Chaudhury, B., Christophorou, L., Carbone, E., Dyatko, N., Franck, C., Fursa, D., Gangwar, R., Guerra, V., Haefliger, P., ... Pancheshnyi, S. (2017). LXCat: an Open-Access, Web-Based Platform for Data Needed for Modeling Low Temperature Plasmas. Plasma Processes and Polymers, 14(1-2), Art: 1600098. [1600098]. https://doi.org/10.1002/ppap.201600098