Abstract
A micrometer-scale cup array containing four spatially resolved material regions is fabricated in a parallel manner using multiple deposition methods. Individual regions are chemically functionalized with nanoscale precision and characterized by high-resolution time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging. The robustness of the chemical patterning strategy is realized by site-specifically positioning ferritin molecules by immobilizing protein repellant/adherent self-assembled monolayers.
Original language | English |
---|---|
Pages (from-to) | 1876-1881 |
Number of pages | 6 |
Journal | Advanced Materials |
Volume | 23 |
Issue number | 16 |
DOIs | |
Publication status | Published - 26 Apr 2011 |
Externally published | Yes |
Keywords
- chemical patterning
- colloidal lithography
- plasma polymerization
- surface analysis