Nanosphere lithography using thermal evaporation of gold

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Nanosphere lithography, which allows for the fabrication of patterned metal surfaces, is a simple, effective and unconventional technique that exploits a self-assembly process. Using this technique, polystyrene nanospheres with diameters of 500nm, and 100nm were assembled onto a 'muscovite' mica substrate in a hexagonally close packed monolayer array, to provide a physical mask for material deposition. Thermal evaporation was subsequently used to deposit gold through the nanosphere mask layer, to generate a periodic array of gold nanostructures. Upon changing the mask to a multi-layered array of nanospheres, slightly more complex nanostructures were achieved. However due to thermal evaporation being a high temperature process the nanostructures obtained deviated from their predicted quasi triangular shape due to a slight annealing of the polystyrene mask.
Original languageEnglish
Title of host publicationMicro- and Nanotechnology
Subtitle of host publicationMaterials, Processes, Packaging, and Systems III
EditorsJung-Chih Chiao, Andrew S. Dzurak, Chennupati Jagadish, David Victor Thiel
ISBN (Print)9780819465238
Publication statusPublished - 2007
EventSPIE International Symposium on Smart Materials, Nano- and Micro-Smart Systems - Adelaide, Australia
Duration: 10 Dec 200613 Dec 2006 (Book of proceedings)

Publication series

NameProceedings of SPIE
ISSN (Print)0277-786X


ConferenceSPIE International Symposium on Smart Materials, Nano- and Micro-Smart Systems
Internet address


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