Negative ion formation through dissociative electron attachment to the group IV tetrabromides: Carbon tetrabromide, silicon tetrabromide and germanium tetrabromide

F Ómarsson, B Reynisson, Michael Brunger, M Hoshino, Hiroshi Tanaka, P Limao-Vieira, O Ingolfsson

    Research output: Contribution to journalArticlepeer-review

    7 Citations (Scopus)

    Fingerprint

    Dive into the research topics of 'Negative ion formation through dissociative electron attachment to the group IV tetrabromides: Carbon tetrabromide, silicon tetrabromide and germanium tetrabromide'. Together they form a unique fingerprint.

    Physics & Astronomy

    Engineering & Materials Science

    Chemical Compounds