Plasma enhanced vortex fluidic device manipulation of graphene oxide

Darryl Jones; Xianjue Chen; Alexander Sibley; Jamie Quinton; Cameron Shearer; Christopher Gibson; Colin Raston

doi:10.1039/c6cc04032b

Plasma enhanced vortex fluidic device manipulation of graphene oxide

Darryl Jones, Xianjue Chen, Alexander Sibley, Jamie Quinton, Cameron Shearer, Christopher Gibson, Colin Raston

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

Original language	English
Pages (from-to)	10755-10758
Number of pages	4
Journal	Chemical Communications
Volume	52
Issue number	71
DOIs	https://doi.org/10.1039/c6cc04032b
Publication status	Published - 2016

Access to Document

10.1039/c6cc04032b

Cite this

@article{7f702475a35b4f3d857ed5e496c070ce,

title = "Plasma enhanced vortex fluidic device manipulation of graphene oxide",

abstract = "A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.",

author = "Darryl Jones and Xianjue Chen and Alexander Sibley and Jamie Quinton and Cameron Shearer and Christopher Gibson and Colin Raston",

year = "2016",

doi = "10.1039/c6cc04032b",

language = "English",

volume = "52",

pages = "10755--10758",

journal = "Chemical Communications",

issn = "1359-7345",

publisher = "ChemComm Communication",

number = "71",

}

TY - JOUR

T1 - Plasma enhanced vortex fluidic device manipulation of graphene oxide

AU - Jones, Darryl

AU - Chen, Xianjue

AU - Sibley, Alexander

AU - Quinton, Jamie

AU - Shearer, Cameron

AU - Gibson, Christopher

AU - Raston, Colin

PY - 2016

Y1 - 2016

N2 - A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

AB - A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

UR - http://www.scopus.com/inward/record.url?scp=84984856775&partnerID=8YFLogxK

U2 - 10.1039/c6cc04032b

DO - 10.1039/c6cc04032b

M3 - Article

SN - 1359-7345

VL - 52

SP - 10755

EP - 10758

JO - Chemical Communications

JF - Chemical Communications

IS - 71

ER -

Plasma enhanced vortex fluidic device manipulation of graphene oxide

Abstract

Access to Document

Other files and links

Fingerprint

Cite this