Plasma enhanced vortex fluidic device manipulation of graphene oxide

Darryl Jones; Xianjue Chen; Alexander Sibley; Jamie Quinton; Cameron Shearer; Christopher Gibson; Colin Raston

doi:10.1039/c6cc04032b

Plasma enhanced vortex fluidic device manipulation of graphene oxide

Darryl Jones, Xianjue Chen, Alexander Sibley, Jamie Quinton, Cameron Shearer, Christopher Gibson, Colin Raston

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

Original language	English
Pages (from-to)	10755-10758
Number of pages	4
Journal	Chemical Communications
Volume	52
Issue number	71
DOIs	https://doi.org/10.1039/c6cc04032b
Publication status	Published - 2016

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title = "Plasma enhanced vortex fluidic device manipulation of graphene oxide",

abstract = "A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.",

author = "Darryl Jones and Xianjue Chen and Alexander Sibley and Jamie Quinton and Cameron Shearer and Christopher Gibson and Colin Raston",

year = "2016",

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AU - Jones, Darryl

AU - Chen, Xianjue

AU - Sibley, Alexander

AU - Quinton, Jamie

AU - Shearer, Cameron

AU - Gibson, Christopher

AU - Raston, Colin

PY - 2016

Y1 - 2016

N2 - A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

AB - A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

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U2 - 10.1039/c6cc04032b

DO - 10.1039/c6cc04032b

M3 - Article

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VL - 52

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EP - 10758

JO - Chemical Communications

JF - Chemical Communications

IS - 71

ER -

Plasma enhanced vortex fluidic device manipulation of graphene oxide

Abstract

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