Practical Plasma Immersion Ion Implantation for Stress Regulation and Treatment of Insulators

M Bilek, David R McKenzie, R N Tarrant, T W H Oates, P Ruch, K Newton-McGee, Yang Shi, D Tompsett, H C Nguyen, B K Gan, D T Kwok

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9 Citations (Scopus)

Abstract

Plasma immersion ion implantation has been attracting the interest of research groups around the world over the last two decades. The technique has been developed to the stage where it is a well-established technique for a number of materials processing applications, such as plasma nitriding. Recent research has focussed on developing the method for a range of new applications, including stress regulation and control of microstructure, as well as surface treatment of insulators. Recent developments in these technologically important applications are discussed in this paper.
Original languageEnglish
Pages (from-to)465-471
Number of pages7
JournalCONTRIBUTIONS TO PLASMA PHYSICS
Volume44
Issue number5-6
Early online date31 Aug 2004
DOIs
Publication statusPublished - Sep 2004
Externally publishedYes

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  • Cite this

    Bilek, M., McKenzie, D. R., Tarrant, R. N., Oates, T. W. H., Ruch, P., Newton-McGee, K., Shi, Y., Tompsett, D., Nguyen, H. C., Gan, B. K., & Kwok, D. T. (2004). Practical Plasma Immersion Ion Implantation for Stress Regulation and Treatment of Insulators. CONTRIBUTIONS TO PLASMA PHYSICS, 44(5-6), 465-471. https://doi.org/10.1002/ctpp.200410065