Plasma immersion ion implantation has been attracting the interest of research groups around the world over the last two decades. The technique has been developed to the stage where it is a well-established technique for a number of materials processing applications, such as plasma nitriding. Recent research has focussed on developing the method for a range of new applications, including stress regulation and control of microstructure, as well as surface treatment of insulators. Recent developments in these technologically important applications are discussed in this paper.
Bilek, M., McKenzie, D. R., Tarrant, R. N., Oates, T. W. H., Ruch, P., Newton-McGee, K., Shi, Y., Tompsett, D., Nguyen, H. C., Gan, B. K., & Kwok, D. T. (2004). Practical Plasma Immersion Ion Implantation for Stress Regulation and Treatment of Insulators. CONTRIBUTIONS TO PLASMA PHYSICS, 44(5-6), 465-471. https://doi.org/10.1002/ctpp.200410065