The mechanism and kinetics of α-NiS oxidation in the temperature range 670-700 °C

Haipeng Wang, Allan Pring, Yung Ngothai, Brian O'Neill

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Fingerprint

Dive into the research topics of 'The mechanism and kinetics of α-NiS oxidation in the temperature range 670-700 °C'. Together they form a unique fingerprint.

Chemistry

Physics

Earth and Planetary Sciences

Biochemistry, Genetics and Molecular Biology